Four methods of cleaning electromagnetic flowmeters summarized in the supply practice of Henan electromagnetic flowmeter manufacturers

Henan electromagnetic flowmeter manufacturers supply four methods of cleaning electromagnetic flowmeters summarized in practice This effect is minimized. If the insulating material in the conductive liquid is likely to be deposited on the electrode or the wall of the measuring tube, mechanical, electrical or chemical cleaning measures can be taken to clean it. 1. Mechanical scraper In this system, each electrode is installed with a rotary scraper, and the blade of the scraper is perpendicular to the electrode surface. The shaft of the scraper is driven by an external motor or manually through a hydraulic seal. Can run continuously or intermittently. The shaft of the scraper is driven by an external motor or manually through a hydraulic seal. Can run continuously or intermittently. This method is generally less used in modern electromagnetic flowmeters 2. Detachable electrode The detachable electrode uses mechanical valves and sealing devices, so the electrode can be disassembled (usually under the working pressure of the pipeline) for external inspection and cleaning 3. Electrolysis or 'burn-out' This method is to connect the voltage of the power supply between the two electrodes (the secondary device is automatically disconnected during this operation), causing electrolysis to occur on the surfaces of the two electrodes, rapidly releasing gas, and causing precipitation material removal. This method is generally used for oily, oily, and sludge-type coverings. The heating of the electrodes can also be used to remove fat and oil deposits from sewage. 4. External oscillators and sensors for ultrasonic cleaning induce high-energy ultrasonic waves on each electrode shaft. By choosing the length of the motor shaft and the frequency of the ultrasonic wave, antinodes are generated on the surface of the electrode, so that local cavitation is formed on the electrode to remove the deposits. This method is generally used for the cleaning of crystalline capping layers

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